Normal view MARC view ISBD view

Photomask and Next-Generation Lithography Mask Technology XI

Komuro, Masanori, ed.

Photomask and Next-Generation Lithography Mask Technology XI [eBook] - Washington, USA SPIE 2004 - Online resource - Proceedings of SPIE; V. 5446 .

ISBN: 9780819453693 (Print)

Print
Request article
Suggest for purchase
Save record
BIBTEX Dublin Core MARCXML MARC (non-Unicode/MARC-8) MARC (Unicode/UTF-8) MARC (Unicode/UTF-8, Standard) MODS (XML) RIS ISBD
More searches

Search for this title in:
Other Libraries (WorldCat) Other Databases (Google Scholar) Online Stores (Bookfinder.com) Open Library (openlibrary.org)