| 000 | 00656nam a2200181Ia 4500 | ||
|---|---|---|---|
| 003 | IN-BaIIA | ||
| 008 | 211028s9999 xx s 000 0 eng d | ||
| 020 | _a9781510630734 (Print) | ||
| 020 | _a9781510630741 (Online) | ||
| 040 | _cIIA Library | ||
| 100 |
_aAndo, Akihiko, ed. _946964 |
||
| 245 | 0 |
_aPhotomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology _h[eBook] |
|
| 260 |
_aWashington, USA _bSPIE _c2019 |
||
| 300 | _aOnline resource | ||
| 490 | _aProceedings of SPIE; V. 11178 | ||
| 856 |
_uhttps://www.spiedigitallibrary.org/conference-proceedings-of-spie/11178 _yClick Here to Access eBook |
||
| 942 | _cEB | ||
| 999 |
_c30782 _d30782 |
||