| 000 | 00581nam a2200169Ia 4500 | ||
|---|---|---|---|
| 003 | IN-BaIIA | ||
| 008 | 211028s9999 xx s 000 0 eng d | ||
| 020 | _a9780819449962 (Print) | ||
| 040 | _cIIA Library | ||
| 100 |
_aTanabe, Hiroyoshi, ed. _946942 |
||
| 245 | 0 |
_aPhotomask and Next-Generation Lithography Mask Technology X _h[eBook] |
|
| 260 |
_aWashington, USA _bSPIE _c2003 |
||
| 300 | _aOnline resource | ||
| 490 | _aProceedings of SPIE; V. 5130 | ||
| 856 |
_uhttps://www.spiedigitallibrary.org/conference-proceedings-of-spie/5130 _yClick Here to Access eBook |
||
| 942 | _cEB | ||
| 999 |
_c30760 _d30760 |
||