TY  - BOOK
AU  - Ando, Akihiko, ed.
TI  - Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
T2  - Proceedings of SPIE; V. 11178
SN  - 9781510630734 (Print)
PY  - 2019///
CY  - Washington, USA
PB  - SPIE
UR  - https://www.spiedigitallibrary.org/conference-proceedings-of-spie/11178
ER  -