00601nam a2200157Ia 4500003000900000008004100009020002600050020002700076040001600103100002300119245011100142260003200253300002000285490003400305856010400339IN-BaIIA211028s9999    xx      s     000 0 eng d  a9781510630734 (Print)  a9781510630741 (Online)  cIIA Library  aAndo, Akihiko, ed. 0aPhotomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technologyh[eBook]  aWashington, USAbSPIEc2019  aOnline resource  aProceedings of SPIE; V. 11178  uhttps://www.spiedigitallibrary.org/conference-proceedings-of-spie/11178yClick Here to Access eBook