00604nam a2200157Ia 4500003000900000008004100009020002600050020002700076040001600103100002600119245011100145260003200256300002000288490003400308856010400342IN-BaIIA211028s9999    xx      s     000 0 eng d  a9781510613898 (Print)  a9781510613904 (Online)  cIIA Library  aTakehisa, Kiwamu, ed. 0aPhotomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technologyh[eBook]  aWashington, USAbSPIEc2017  aOnline resource  aProceedings of SPIE; V. 10454  uhttps://www.spiedigitallibrary.org/conference-proceedings-of-spie/10454yClick Here to Access eBook