Takehisa, Kiwamu, ed. <br/><br/>
Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology  [eBook] 

 - Washington, USA  SPIE  2017 
 - Online resource 
 - Proceedings of SPIE; V. 10454 .
<br/><br/><label>ISBN: </label>9781510613898 (Print) 9781510613904 (Online)