00783nam a2200181Ia 4500003000900000008004100009020002600050040001600076100003500092245009800127260003200225300002000257490003300277856010300310942000700413999001700420952016400437IN-BaIIA211028s9999    xx      s     000 0 eng d  a9781628418712 (Print)  cIIA Library  aYoshioka, Nobuyuki, ed.946960 0aPhotomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXIIh[eBook]  aWashington, USAbSPIEc2015  aOnline resource  aProceedings of SPIE; V. 9658  uhttps://www.spiedigitallibrary.org/conference-proceedings-of-spie/9658yClick Here to Access eBook  cEB  c30778d30778  00104070aBANbBANd2011-07-01eSPIEhV. 9658l0pEB10238r2021-11-05uhttps://www.spiedigitallibrary.org/conference-proceedings-of-spie/9658w2021-11-05yEB