00552nam a2200145Ia 4500003000900000008004100009020002600050040001600076100002800092245009800120260003200218300002000250490003300270856010300303IN-BaIIA211028s9999    xx      s     000 0 eng d  a9781628418712 (Print)  cIIA Library  aYoshioka, Nobuyuki, ed. 0aPhotomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXIIh[eBook]  aWashington, USAbSPIEc2015  aOnline resource  aProceedings of SPIE; V. 9658  uhttps://www.spiedigitallibrary.org/conference-proceedings-of-spie/9658yClick Here to Access eBook