TY  - BOOK
AU  - Kato, Kokoro, ed.
TI  - Photomask and Next-Generation Lithography Mask Technology XX
T2  - Proceedings of SPIE; V. 8701
SN  - 9780819494917 (Print)
PY  - 2013///
CY  - Washington, USA
PB  - SPIE
UR  - https://www.spiedigitallibrary.org/conference-proceedings-of-spie/8701
ER  -