TY  - BOOK
AU  - Konishi, Toshio, ed.
TI  - Photomask and Next-Generation Lithography Mask Technology XVIII
T2  - Proceedings of SPIE; V. 8081
SN  - 9780819486738 (Print)
PY  - 2011///
CY  - Washington, USA
PB  - SPIE
UR  - https://www.spiedigitallibrary.org/conference-proceedings-of-spie/8081
ER  -