TY  - BOOK
AU  - Hosono, Kunihiro, ed.
TI  - Photomask and Next-Generation Lithography Mask Technology XVII
T2  - Proceedings of SPIE; V. 7748
SN  - 9780819482389 (Print)
PY  - 2010///
CY  - Washington, USA
PB  - SPIE
UR  - https://www.spiedigitallibrary.org/conference-proceedings-of-spie/7748
ER  -