TY  - BOOK
AU  - Hosono, Kunihiro, ed.
TI  - Photomask and Next-Generation Lithography Mask Technology XVI
T2  - Proceedings of SPIE; V. 7379
SN  - 9780819476562 (Print)
PY  - 2009///
CY  - Washington, USA
PB  - SPIE
UR  - https://www.spiedigitallibrary.org/conference-proceedings-of-spie/7379
ER  -