TY  - BOOK
AU  - Houga, Morihisa, ed.
TI  - Photomask and Next-Generation Lithography Mask Technology XIII
T2  - Proceedings of SPIE; V. 6283
SN  - 9780819463586 (Print)
PY  - 2006///
CY  - Washington, USA
PB  - SPIE
UR  - https://www.spiedigitallibrary.org/conference-proceedings-of-spie/6283
ER  -