TY  - BOOK
AU  - Komuro, Masanori, ed.
TI  - Photomask and Next-Generation Lithography Mask Technology XII
T2  - Proceedings of SPIE; V. 5853
SN  - 9780819458537 (Print)
PY  - 2005///
CY  - Washington, USA
PB  - SPIE
UR  - https://www.spiedigitallibrary.org/conference-proceedings-of-spie/5853
ER  -