TY  - BOOK
AU  - Komuro, Masanori, ed.
TI  - Photomask and Next-Generation Lithography Mask Technology XI
T2  - Proceedings of SPIE; V. 5446
SN  - 9780819453693 (Print)
PY  - 2004///
CY  - Washington, USA
PB  - SPIE
UR  - https://www.spiedigitallibrary.org/conference-proceedings-of-spie/5446
ER  -