TY  - BOOK
AU  - Tanabe, Hiroyoshi, ed.
TI  - Photomask and Next-Generation Lithography Mask Technology X
T2  - Proceedings of SPIE; V. 5130
SN  - 9780819449962 (Print)
PY  - 2003///
CY  - Washington, USA
PB  - SPIE
UR  - https://www.spiedigitallibrary.org/conference-proceedings-of-spie/5130
ER  -