TY  - BOOK
AU  - Kawahira, Hiroichi, ed.
TI  - Photomask and Next-Generation Lithography Mask Technology VIII
T2  - Proceedings of SPIE; V. 4409
SN  - 9780819441119 (Print)
PY  - 2001///
CY  - Washington, USA
PB  - SPIE
UR  - https://www.spiedigitallibrary.org/conference-proceedings-of-spie/4409
ER  -