TY  - BOOK
AU  - Morimoto, Hiroaki, ed.
TI  - Photomask and Next-Generation Lithography Mask Technology VII
T2  - Proceedings of SPIE; V. 4066
SN  - 9780819437020 (Print)
PY  - 2000///
CY  - Washington, USA
PB  - SPIE
UR  - https://www.spiedigitallibrary.org/conference-proceedings-of-spie/4066
ER  -