TY  - BOOK
AU  - Kawahira, Hiroichi, ed.
TI  - Photomask and Next-Generation Lithography Mask Technology IX
T2  - Proceedings of SPIE; V. 4754
SN  - 9780819445179 (Print)
PY  - 2002///
CY  - Washington, USA
PB  - SPIE
UR  - https://www.spiedigitallibrary.org/conference-proceedings-of-spie/4754
ER  -