TY  - BOOK
AU  - Seeger, David, ed.
TI  - Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI
T2  - Proceedings of SPIE; V. 2723
SN  - 9780819420992 (Print)
PY  - 1996///
CY  - Washington, USA
PB  - SPIE
UR  - https://www.spiedigitallibrary.org/conference-proceedings-of-spie/2723
ER  -