TY  - BOOK
AU  - Warlaumont, John, ed.
TI  - Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V
T2  - Proceedings of SPIE; V. 2437
SN  - 9780819417855 (Print)
PY  - 1995///
CY  - Washington, USA
PB  - SPIE
UR  - https://www.spiedigitallibrary.org/conference-proceedings-of-spie/2437
ER  -